Publications
37
Lab publications since 2021
114
Citations, lab papers since 2021
4,236
PI career citations
36
PI h-index
Citation metrics update automatically from OpenAlex. Prof. Yu's complete publication record is on Google Scholar.
Publications per Year
Journal
Conference
View data table
| Year | Journal | Conference | Total |
|---|---|---|---|
| 2021 | 0 | 1 | 1 |
| 2022 | 3 | 2 | 5 |
| 2023 | 3 | 4 | 7 |
| 2024 | 3 | 5 | 8 |
| 2025 | 1 | 6 | 7 |
| 2026 | 1 | 8 | 9 |
PAL Lab members are shown in bold. Click a title to open the paper, or copy a citation with the BibTeX button.
2026
Journal Papers
High contrast EUV imaging enabled by topological quasi phase-only masks
Optics Express 34, (16), 30091, doi: 10.1364/OE.607043
Conference Papers
52-5: Late-News & Invited Paper: Mass-Producible Dual-Focal AR Waveguide Display via KrF-Fabricated Stitched Metalens Array
SID Symposium Digest of Technical Papers 57, (1), 729–731, doi: 10.1002/sdtp.70001_200
P-267: Late-News Poster: Large-area Visible Metalens Fabricated by KrF Photolithography Using Double Patterning and Optical Proximity Correction (OPC)
SID Symposium Digest of Technical Papers 57, (1), 2280–2283, doi: 10.1002/sdtp.70001_623
52-4: Metasurface-Integrated Augmented Reality Waveguide Enabled by Resolution Enhancement Technology in KrF Photolithography
SID Symposium Digest of Technical Papers 57, (1), 725–728, doi: 10.1002/sdtp.70001_199
Exploiting phase-shifting low-n, low-k absorbers for dense contact hole patterning in EUV lithography
Optical and EUV Nanolithography XXXIX 13979, 436–443
Inverse design framework for topological quasi phase-only masks in EUV lithography
Optical and EUV Nanolithography XXXIX 13979, 378–386
Mitigate slit position dependent cd variation with source optimization
Optical and EUV Nanolithography XXXIX 13979, 139792D
Cloud-based curvilinear OPC for free-form reticle designs in silicon photonics and metasurfaces
Novel Patterning Technologies 2026 PC139820Y
Unsupervised neural-network proximity correction (NNPC) for large-area chiral metasurface
Novel Patterning Technologies 2026 13982, 221–227
2025
Journal Papers
Intelligent Proximity Correction Enabled Large-Area Metasurfaces by KrF Photolithography
IEEE Access doi: 10.1109/ACCESS.2025.3631947
Cited by 1
Conference Papers
Reducing M3D effects in EUV masks by balancing diffraction orders
Optical and EUV Nanolithography XXXVIII PC134240N, doi: 10.1117/12.3051579
Large area metalens and AR waveguides fabricated by DUV KrF lithography via intelligent proximity correction (IPC)
Metrology, Inspection, and Process Control XXXIX 13426, 1342644, doi: 10.1117/12.3057618
Practical inverse mask synthesis via data-efficient physics-informed neural networks (PINN) model
DTCO and Computational Patterning IV 13425, 390–396, doi: 10.1117/12.3056774
Quasi phase-only mask (POM) for high contrast EUV imaging
Optical and EUV Nanolithography XXXVIII 13424, 513–520, doi: 10.1117/12.3051257
Reducing eye glow in augmented reality waveguide through topological metagrating design
Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality doi: 10.1117/12.3058114
Metalens integrated Maxwellian view display for augmented reality glasses
Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality doi: 10.1117/12.3058115
2024
Journal Papers
A Novel Optical Proximity Correction Machine Learning Model Using a Single-Flow Convolutional Feedback Networks with Customized Attention
IEEE Access doi: 10.1109/ACCESS.2024.3494816
Cited by 1
Integrated Pressure and Proximity Sensors on Silicone and PU Substrates That Supports Flexible Hybrid Electronics
IEEE Journal on Flexible Electronics 3, (6), 259–265, doi: 10.1109/JFLEX.2024.3406288
Cited by 1
Inverse reticle optimization with quantum annealing and hybrid solvers
IEEE Access 12, 33069–33078, doi: 10.1109/ACCESS.2024.3370475
Cited by 3
Conference Papers
Metasurface Design, Fabrication, and Applications
2024 33rd Wireless and Optical Communications Conference (WOCC) 152–153, doi: 10.1109/WOCC61718.2024.10786047
Cited by 2
75-4: Late-News Paper: Metalens-Integrated Augmented Reality (AR) Waveguides for Eye-tracking: A Proof of Concept
SID Symposium Digest of Technical Papers 55, (1), 1038–1040, doi: 10.1002/sdtp.17714
Cited by 1
P-227: Late-News Poster: Design Freeform Metagratings for Eye-glow Attenuation in Diffractive AR Waveguides
SID Symposium Digest of Technical Papers 55, (1), 1567–1569, doi: 10.1002/sdtp.17857
Tackling data inconsistency and runtime issues in inverse lithography technology (ILT) with comparative convergence study
DTCO and Computational Patterning III 12954, 420–427, doi: 10.1117/12.3007748
Cited by 2
Enhancing CD-SEM accuracy with attention-boosted Noise2Noise model
Metrology, Inspection, and Process Control XXXVIII 12955, 598–605, doi: 10.1117/12.3009959
Cited by 1
2023
Journal Papers
Thermal and photochemical stability studies of color-converted microLED microdisplay panels
IEEE Photonics Journal 15, (3), 1–6, doi: 10.1109/JPHOT.2023.3281571
Cited by 6
Novel graphene transfer method to silicone and its sensing application on porous PDMS
IEEE Sensors Letters 7, (5), 1–4, doi: 10.1109/LSENS.2023.3265702
Cited by 5
Metasurfaces on silicon photonic waveguides for simultaneous emission phase and amplitude control
Optics Express 31, (8), 12487–12496, doi: 10.1364/OE.487589
Cited by 21
Conference Papers
Metadiffuser fabricated by DUV KrF 248nm photolithography for wavefront manipulation
Metamaterials, Metadevices, and Metasystems 2023 12646, 37–44, doi: 10.1117/12.2677996
Intelligent reticle modification enabled large-area metalens patterning
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX doi: 10.1117/12.2685760
Cited by 1
Investigation on attention-based convolutional architectures applied to optical proximity corrections
Emerging Topics in Artificial Intelligence (ETAI) 2023 PC126550M, doi: 10.1117/12.2676658
Cited by 1
Functional composite silicone made by roll-to-roll manufacturing for sensing applications and circular economy
2023 IEEE International Flexible Electronics Technology Conference (IFETC) 1–3, doi: 10.1109/IFETC57334.2023.10254922
Cited by 1
2022
Journal Papers
I-line photolithographic metalenses enabled by distributed optical proximity correction with a deep-learning model
Optics Express 30, (12), 21184, doi: 10.1364/oe.456469
Cited by 19
Optical proximity correction using machine learning assisted human decision
IEEE Photonics Journal 15, (1), 1–9, doi: 10.1109/JPHOT.2022.3231426
Cited by 6
Integrated metasurfaces on silicon photonics for emission shaping and holographic projection
Nanophotonics 11, (21), 4687–4695, doi: 10.1515/nanoph-2022-0344
Cited by 42
Conference Papers
Near-infrared metalenses employing hyperuniform disordered arrangement of nanostructures
Metamaterials, Metadevices, and Metasystems 2022 99, doi: 10.1117/12.2644670
High-efficiency photolithographic NIR metalenses enabled by optical proximity correction with a neural-network lithographic model
Metamaterials, Metadevices, and Metasystems 2022 PC1219521, doi: 10.1117/12.2644847
2021
Conference Papers
Distributed optical proximity correction with deep-learning lithographic model for i-line photolithography
Emerging Topics in Artificial Intelligence (ETAI) 2021 11804, 1180421, doi: 10.1117/12.2593408