Hsuehli Liu received the bachelor's degree in photonics from National Yang Ming Chiao Tung University, in 2019, where he is currently pursuing the Ph.D. degree. His research focuses on metasurface optics, photolithography, optical proximity correction (OPC), and the application of deep neural networks for lithography modeling and computational acceleration. In particular, he explores data-driven techniques for layout-to-image prediction and OPC mask optimization using deep-learning models. He is a Student Member of SPIE and has received multiple research awards in Taiwan.

Po-Hsun Fang is a PhD student in the Department of Photonics at National Yang Ming Chiao Tung University (NYCU), Taiwan, working under Prof. Yu. His research focuses on computational lithography, including inverse lithography technology, optical proximity correction, and quantum computing applications for semiconductor manufacturing. He is involved in TSMC's Joint Development Program and D-Wave quantum computing projects. Po-Hsun received the ASML Best Student Paper Award at SPIE Advanced Lithography + Patterning 2025 for his work on quasi Phase-Only Masks in EUV lithography. His current interests include MEEF-based OPC using quantum annealing and machine learning approaches for lithography optimization.