Biography

PEICHEN YU (Member, IEEE) received the Ph.D. degree in electrical engineering from the University of Michigan, Ann Arbor, MI, USA, in 2004. From 2004 to 2006, she joined the Advanced Design Group, Intel Corporation, Hillsboro, OR, USA, as a Resolution Enhancement Technology (RET) Design Engineer. Since 2006, she switched careers to academia and is currently a Professor with the Department of Photonics, National Yang Ming Chiao Tung University. Her research interests include nanostructures and metasurfaces patterning for optoelectronic applications. She is also actively engaged in the development of RET solutions, including inverse lithography technology (ILT) for ArF 193i and EUV lithography. She has published over 60 refereed technical articles in the above research areas. Her work has been highlighted in various scientific journals, including Virtual Journal of Nanoscale Science and Technology, SPIE Newsroom, and NPG Nature Asia-Material. She is also a member of the IEEE Photonics Society and SPIE. She received several research and teaching awards in Taiwan.

Research Interests

• Cloud-native, GPU-accelerated optical proximity correction (OPC+) platform
• AI-driven Inverse Lithography technology (ILT) strategies
• Inverse mask and illumination synthesis approaches for advanced CMOS nodes
• Large-area metasurfaces and diffractive Augmented Reality (AR) waveguide structures
• Hybrid organic/inorganic hetero-junction solar cells
• Transparent conductive nano-materials for optoelectronic devices
• Nano-fabrication technologies for multi-junction, silicon, and polymer solar cells

Achievements & Membership

Honors and Awards

Society Service

• Area1 Program Chair, 44th IEEE PVSC (2017)
• Program Committee, IEEE PVSC (2011-2016), IEEE NANO (2009, 2011), OPTIC (2009-2025)
• Regional Executive Director, ANNA-Taiwan
• Reviewer for Advanced Materials, ACS Nano, Optics Express, Applied Physics Letters, etc.