OPC+ Cloud Platform — GPU-accelerated mask correction

OPC+ Cloud Platform

Cloud-native, GPU-accelerated optical proximity correction with native curvilinear mask support — professional-grade mask correction for everyone.

50× faster than CPU solvers Native curvilinear masks 2026 Future Tech Award
🚀 Launch Platform 🎬 Watch Demo 📄 Brochure (EN) 📄 手冊 (中文)

Why Mask Correction Matters

Chips and photonic devices are printed by projecting light through a patterned mask. Because the light's wavelength is comparable to the features being printed, diffraction distorts the result: corners round off, line widths drift, and the smallest features can vanish entirely. Optical Proximity Correction (OPC) pre-distorts the mask so the printed pattern matches the designer's intent.

Target — without correction
Uncorrected mask layout
Mask layout
Wafer image printed from the uncorrected mask: detail is lost
Printed wafer
OPC mask — with correction
Pre-distorted OPC mask layout
Mask layout
Wafer image printed from the OPC mask: the intended pattern is restored
Printed wafer

Without correction (left) the printed wafer image loses detail; the pre-distorted OPC mask (right) restores the intended pattern.

Traditional OPC is slow

CPU-bound serial solvers take hours per job. OPC+ runs CUDA multi-stream parallelism on GPU clusters — 50× faster.

…expensive and exclusive

Commercial licenses and required expertise shut out startups and research labs. OPC+ is a web interface: upload, configure, submit.

…and Manhattan-only

Legacy tools force curved photonic designs into rectilinear approximations. OPC+ corrects freeform and curvilinear masks natively.

Fabricated Proof: SEM Before / After

These scanning electron microscope images show real devices fabricated with and without OPC+ correction — the difference is not simulated.

Line patterns — line-end shortening

Diffraction makes printed line ends recede inward, so lines come out shorter than designed. OPC extends the mask at line ends to restore the intended length.

Without OPC SEM of line patterns without OPC: line ends recede and undershoot the target length

Line ends visibly recede; printed length undershoots the target.

With OPC+ SEM of line patterns with OPC: line ends accurately reproduced

Line ends accurately reproduced; critical dimension restored.

Ring resonator — fatal defect eliminated

In photonic ring resonators the narrow coupling gap decides whether the device works at all. Without correction the gap fails to open — a fatal defect. With OPC+ the geometry prints cleanly.

Without OPC SEM of a ring resonator without OPC: the coupling gap region fails to open

Coupling region not opened — the device is non-functional.

With OPC+ SEM of a ring resonator with OPC: coupling region fully resolved

Coupling region fully resolved — the device is functional.

Metalens — sub-wavelength features survive

A metalens is made of densely packed nano-structures whose exact shapes set the optical phase profile. Without correction the smallest features distort or disappear; with OPC+ every feature prints, preserving the lens function.

Without OPC SEM of metalens structures without OPC: small features fail to resolve

Critical nano-structures lost or severely distorted.

With OPC+ SEM of metalens structures with OPC: all sub-wavelength features fully resolved

All sub-wavelength features fully resolved; phase profile preserved.

How It Works

Upload a GDS/OASIS layout, set your scanner parameters, and submit — the platform integrates three modules into one automated pipeline.

1

Mask Correction

Full-mask inverse lithography (ILT) with contour-based global optimization — higher pattern fidelity than rule-based edge correction.

2

Lithography Simulation

High-fidelity aerial image simulation for your scanner: wavelength, NA, resolution, and illumination source configuration.

3

Model Calibration

Imaging models fitted to your fab's CD-SEM measurements, capturing scanner, resist, and process variations.

Full technical documentation, comparison tables, and deployment options →

Recognition & Validation

🏆 2026 Future Tech Award

Awarded by Taiwan's National Science and Technology Council in the Semiconductor / Photonics / Communications category.

Industry & academic validation

Validated through collaborations with the Taiwan Semiconductor Research Institute (TSRI) and the University of Southampton, UK.

Joint development

Built by PAL Lab with the NYCU Network and System Laboratory (NSL); supported by the National Science and Technology Council.

Key Publications

Try OPC+ on your own design

Register on the platform for research or professional use — the interface supports English and Traditional Chinese.

Get Started at opc-cloud.com