Po-Hsun Fang is a PhD student in the Department of Photonics at National Yang Ming Chiao Tung University (NYCU), Taiwan, working under Prof. Yu. His research focuses on computational lithography, including inverse lithography technology, optical proximity correction, and quantum computing applications for semiconductor manufacturing. He is involved in TSMC's Joint Development Program and D-Wave quantum computing projects. Po-Hsun received the ASML Best Student Paper Award at SPIE Advanced Lithography + Patterning 2025 for his work on quasi Phase-Only Masks in EUV lithography. His current interests include MEEF-based OPC using quantum annealing and machine learning approaches for lithography optimization.

CHIA-WEI CHANG received the B.S. degree in photonics from Feng Chia University, Taichung, Taiwan. He is currently pursuing the M.S. degree in electro-optical engineering with National Yang Ming Chiao Tung University, Hsinchu, Taiwan. He has worked with United Microelectronics Corporation, Hsinchu, and Giga Solution Tech. Company Ltd., Hsinchu. He is currently with the Taiwan Semiconductor Research Institute, Hsinchu. His research interests include MEEF and OPC modeling, lithography process optimization, and metasurface-based optical system design